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[Orchid] Etching with Press-N-Peel
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Joan Hammond Wednesday, July 31, 2002
   
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    I'm having difficulty maintaining a solidly resistant mask when I
    etch copper and brass in ferric chloride using Press-n-Peel. Even
    with a slow solution, the ferric chloride eats through the resist, so
    that the area that is protected has pitting, similar to an aquatint.
    Some surfaces remain completely masked. I want to be able to achieve
    a deep etch in brass, to make a plate I can use in the rolling mill.
    I also want to do more shallow etches using copper/silver bimetal. 

    I've followed the procedures I received with the P-n-P--as follows: 

    Clean copper or brass (water sheets off) HP LaserJet to print design
    on p-n-p Iron set on 3 (polyester/rayon setting) Air cooled or
    quenched before peeling mask off Tested by etching in half-hour
    increments from 30 minutes to 3 hours: Test strip A in used, nearly
    spent ferric chloride and Test strip B in fresh, full-strength ferric
    chloride. Both etched through the mask, though A didn't start to etch
    through until about 2 hours. 

    I'll appreciate any help other Orchid members have to offer. 

Joan Hammond



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